China makes progress in 3-nm chips without advanced lithography tools

🇨🇳 Article en anglais

Chinese researchers have made early strides in pushing semiconductor processing nodes below 3-nm using older lithography technology, as more advanced extreme ultraviolet lithography (EUV) tools from ASML remain blocked under US sanctions. The breakthrough marks the latest progress in China’s drive to chart an alternative path to advanced

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Source : South China Morning Post. Le Fil Indépendant cite et lie cet article ; il n'en est ni l'auteur ni l'éditeur.